Waste gas treatment device

Provided is an exhaust gas treatment device capable of efficiently eliminating toxic gas contained in exhaust gas without increasing the size of the device. An exhaust gas treatment device (100) is provided with: a main body (1) in which a flow path (1a) through which a liquid flows is formed; an ex...

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Bibliographische Detailangaben
Hauptverfasser: SHAMOTO MITSUHIRO, KYOYA TAKASHI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:Provided is an exhaust gas treatment device capable of efficiently eliminating toxic gas contained in exhaust gas without increasing the size of the device. An exhaust gas treatment device (100) is provided with: a main body (1) in which a flow path (1a) through which a liquid flows is formed; an exhaust gas supply line (2) that is connected to the main body (1) and supplies exhaust gas to a flow path (1a) through which the liquid flows; a suction device (3) that sucks the exhaust gas from the exhaust gas supply line (2) to the flow path (1a); a low-temperature plasma generation device (5) that generates low-temperature plasma in the flow path (1a) and decomposes harmful gas; and a discharge line (7) for discharging the exhaust gas from the main body (1), said exhaust gas having passed through the low-temperature plasma generation device (5). 提供一种废气处理装置,能够不使装置大型化而对废气中含有的有毒气体效率良好地除害。废气处理装置(100)具备:形成有供液体流动的流路(1a)的主体(1);与主体(1)连结并向供液体流动的流路(1a)供给废气的废气供给线路(2);从废气供给线路(2)向流路(1a)吸引废气的吸引装置(3);在流路(1a)产生低温等离子,分解有害气体的低温等离