PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE INCLUDING THE SAME

The present invention relates to a photosensitive resin composition and a display device comprising the same, and more particularly, to a photosensitive resin composition comprising: an esterified quinonediazide compound comprising a substituent having a specific structure; an alkali-soluble polymer...

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Bibliographische Detailangaben
Hauptverfasser:	SONG IN-HO, YOUN HYOC-MIN, LYU TAIXUN, KIM DONG-MYUNG, ZHANG GENSHI, LEE SUK-HYUN, LEE SUN HEE, WU LULI, PARK AHREUM
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention relates to a photosensitive resin composition and a display device comprising the same, and more particularly, to a photosensitive resin composition comprising: an esterified quinonediazide compound comprising a substituent having a specific structure; an alkali-soluble polymer resin containing one or more structures selected from the group consisting of polyamic acid, polyamic acid ester, and polyimide; and a solvent; the photosensitive resin composition has excellent sensitivity, chemical resistance, sunlight resistance, and driving reliability, and a display device including the photosensitive resin composition. 本发明涉及一种感光树脂组合物以及包含所述感光树脂组合物的显示设备，尤其涉及一种感光树脂组合物，包括：包含具有特定结构的取代基的酯化的醌二叠氮化合物；碱性可溶性高分子树脂，包含从由聚酰胺酸、聚酰胺酸酯以及聚酰亚胺构成的组中选择的一种或多种结构；以及溶剂；从而灵敏度、耐化学性、耐日光性以及驱动可靠性优秀的感光树脂组合物以及包含所述感光树脂组合物的显示设备。