Optical isolation module
A light source for a lithographic tool includes a source configured to emit a first light beam and a second light beam, the first light beam having a first wavelength and the second light beam having a second wavelength, the first wavelength and the second wavelength being different; an amplifier co...
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| creator | SCHAFGANS ALEXANDER ANTHONY BROWN DANIEL J W TAO YEZHENG DAS PARIJAT PRAKASH |
| description | A light source for a lithographic tool includes a source configured to emit a first light beam and a second light beam, the first light beam having a first wavelength and the second light beam having a second wavelength, the first wavelength and the second wavelength being different; an amplifier configured to amplify the first light beam and the second light beam to generate a first amplified light beam and a second amplified light beam, respectively; and an optical isolator between the light source and the amplifier, the optical isolator comprising: a plurality of dichroic optical elements and an optical modulator between two dichroic optical elements.
用于光刻工具的光源包括：被配置为发出第一光束和第二光束的源，第一光束具有第一波长，并且第二光束具有第二波长，第一波长和第二波长不同；放大器，被配置为将第一光束和第二光束放大，以分别产生第一放大光束和第二放大光束；以及光源与放大器之间的光学隔离器，光学隔离器包括：多个二向色光学元件以及两个二向色光学元件之间的光学调制器。 |
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用于光刻工具的光源包括：被配置为发出第一光束和第二光束的源，第一光束具有第一波长，并且第二光束具有第二波长，第一波长和第二波长不同；放大器，被配置为将第一光束和第二光束放大，以分别产生第一放大光束和第二放大光束；以及光源与放大器之间的光学隔离器，光学隔离器包括：多个二向色光学元件以及两个二向色光学元件之间的光学调制器。</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ; ELECTROGRAPHY ; FREQUENCY-CHANGING ; HOLOGRAPHY ; MATERIALS THEREFOR ; NON-LINEAR OPTICS ; OPTICAL ANALOGUE/DIGITAL CONVERTERS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICAL LOGIC ELEMENTS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240402&DB=EPODOC&CC=CN&NR=117806136A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240402&DB=EPODOC&CC=CN&NR=117806136A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SCHAFGANS ALEXANDER ANTHONY</creatorcontrib><creatorcontrib>BROWN DANIEL J W</creatorcontrib><creatorcontrib>TAO YEZHENG</creatorcontrib><creatorcontrib>DAS PARIJAT PRAKASH</creatorcontrib><title>Optical isolation module</title><description>A light source for a lithographic tool includes a source configured to emit a first light beam and a second light beam, the first light beam having a first wavelength and the second light beam having a second wavelength, the first wavelength and the second wavelength being different; an amplifier configured to amplify the first light beam and the second light beam to generate a first amplified light beam and a second amplified light beam, respectively; and an optical isolator between the light source and the amplifier, the optical isolator comprising: a plurality of dichroic optical elements and an optical modulator between two dichroic optical elements.
用于光刻工具的光源包括：被配置为发出第一光束和第二光束的源，第一光束具有第一波长，并且第二光束具有第二波长，第一波长和第二波长不同；放大器，被配置为将第一光束和第二光束放大，以分别产生第一放大光束和第二放大光束；以及光源与放大器之间的光学隔离器，光学隔离器包括：多个二向色光学元件以及两个二向色光学元件之间的光学调制器。</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</subject><subject>ELECTROGRAPHY</subject><subject>FREQUENCY-CHANGING</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>NON-LINEAR OPTICS</subject><subject>OPTICAL ANALOGUE/DIGITAL CONVERTERS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICAL LOGIC ELEMENTS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJDwLyjJTE7MUcgszs9JLMnMz1PIzU8pzUnlYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GhuYWBmaGxmaOxsSoAQABSyJl</recordid><startdate>20240402</startdate><enddate>20240402</enddate><creator>SCHAFGANS ALEXANDER ANTHONY</creator><creator>BROWN DANIEL J W</creator><creator>TAO YEZHENG</creator><creator>DAS PARIJAT PRAKASH</creator><scope>EVB</scope></search><sort><creationdate>20240402</creationdate><title>Optical isolation module</title><author>SCHAFGANS ALEXANDER ANTHONY ; BROWN DANIEL J W ; TAO YEZHENG ; DAS PARIJAT PRAKASH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN117806136A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</topic><topic>ELECTROGRAPHY</topic><topic>FREQUENCY-CHANGING</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>NON-LINEAR OPTICS</topic><topic>OPTICAL ANALOGUE/DIGITAL CONVERTERS</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICAL LOGIC ELEMENTS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</topic><toplevel>online_resources</toplevel><creatorcontrib>SCHAFGANS ALEXANDER ANTHONY</creatorcontrib><creatorcontrib>BROWN DANIEL J W</creatorcontrib><creatorcontrib>TAO YEZHENG</creatorcontrib><creatorcontrib>DAS PARIJAT PRAKASH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SCHAFGANS ALEXANDER ANTHONY</au><au>BROWN DANIEL J W</au><au>TAO YEZHENG</au><au>DAS PARIJAT PRAKASH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Optical isolation module</title><date>2024-04-02</date><risdate>2024</risdate><abstract>A light source for a lithographic tool includes a source configured to emit a first light beam and a second light beam, the first light beam having a first wavelength and the second light beam having a second wavelength, the first wavelength and the second wavelength being different; an amplifier configured to amplify the first light beam and the second light beam to generate a first amplified light beam and a second amplified light beam, respectively; and an optical isolator between the light source and the amplifier, the optical isolator comprising: a plurality of dichroic optical elements and an optical modulator between two dichroic optical elements.
用于光刻工具的光源包括：被配置为发出第一光束和第二光束的源，第一光束具有第一波长，并且第二光束具有第二波长，第一波长和第二波长不同；放大器，被配置为将第一光束和第二光束放大，以分别产生第一放大光束和第二放大光束；以及光源与放大器之间的光学隔离器，光学隔离器包括：多个二向色光学元件以及两个二向色光学元件之间的光学调制器。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF |
| title | Optical isolation module |
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