Optical isolation module

A light source for a lithographic tool includes a source configured to emit a first light beam and a second light beam, the first light beam having a first wavelength and the second light beam having a second wavelength, the first wavelength and the second wavelength being different; an amplifier co...

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Bibliographische Detailangaben
Hauptverfasser: SCHAFGANS ALEXANDER ANTHONY, BROWN DANIEL J W, TAO YEZHENG, DAS PARIJAT PRAKASH
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:A light source for a lithographic tool includes a source configured to emit a first light beam and a second light beam, the first light beam having a first wavelength and the second light beam having a second wavelength, the first wavelength and the second wavelength being different; an amplifier configured to amplify the first light beam and the second light beam to generate a first amplified light beam and a second amplified light beam, respectively; and an optical isolator between the light source and the amplifier, the optical isolator comprising: a plurality of dichroic optical elements and an optical modulator between two dichroic optical elements. 用于光刻工具的光源包括:被配置为发出第一光束和第二光束的源,第一光束具有第一波长,并且第二光束具有第二波长,第一波长和第二波长不同;放大器,被配置为将第一光束和第二光束放大,以分别产生第一放大光束和第二放大光束;以及光源与放大器之间的光学隔离器,光学隔离器包括:多个二向色光学元件以及两个二向色光学元件之间的光学调制器。