Preparation method of heterojunction cell with double-sided microcrystals and cell prepared by using heterojunction cell with double-sided microcrystals
The invention relates to the technical field of heterojunction cell preparation, in particular to a preparation method of a double-sided microcrystal heterojunction cell and a cell prepared by adopting the double-sided microcrystal heterojunction cell, and the preparation method comprises the follow...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to the technical field of heterojunction cell preparation, in particular to a preparation method of a double-sided microcrystal heterojunction cell and a cell prepared by adopting the double-sided microcrystal heterojunction cell, and the preparation method comprises the following steps: selecting a crystal silicon wafer, and performing texturing on the crystal silicon wafer to serve as a crystal silicon substrate; preparing intrinsic amorphous silicon thin film layers on the front surface and the back surface of the crystalline silicon substrate respectively; preparing an N-type microcrystalline silicon doped layer on the top surface of the intrinsic amorphous silicon thin film layer on the front surface of the crystalline silicon substrate; preparing a P-type microcrystalline silicon doped layer on the bottom surface of the intrinsic amorphous silicon thin film layer on the back surface of the crystalline silicon substrate; preparing light-transmitting conductive layers on the top surf |
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