Isostatic pressing graphite processing cooling equipment for semiconductor large silicon wafer manufacturing
The invention relates to the related field of isostatic pressing graphite cooling equipment, in particular to isostatic pressing graphite processing cooling equipment for semiconductor large silicon wafer manufacturing, which comprises two cooling cavities and two inner clamp layers, each inner clam...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to the related field of isostatic pressing graphite cooling equipment, in particular to isostatic pressing graphite processing cooling equipment for semiconductor large silicon wafer manufacturing, which comprises two cooling cavities and two inner clamp layers, each inner clamp layer comprises an outer sealing plate, an outer clamp and an end part top plate, each outer clamp comprises a plurality of special-shaped clamps, and each special-shaped clamp comprises an outer sealing plate, an outer sealing plate and an end part top plate; each special-shaped clamp comprises a short clamping plate and a long clamping plate; each cooling cavity is provided with a plurality of sets of air inlets, and each outer sealing plate is provided with an exhaust port. The long clamping plate and the short clamping plate are respectively arranged on the special-shaped clamp, and graphite columns with any size in a certain size range can be clamped by matching with tip inclined surface parts on the long cl |
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