Flexible tail gas recovery circuit system of CVD (Chemical Vapor Deposition) process equipment and control method
The invention discloses a flexible tail gas recovery circuit system of CVD (chemical vapor deposition) process equipment, which comprises a heating unit, a temperature measuring unit, a heating switch unit and an electronic regulator, and is characterized in that the heating unit is mounted on a tai...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a flexible tail gas recovery circuit system of CVD (chemical vapor deposition) process equipment, which comprises a heating unit, a temperature measuring unit, a heating switch unit and an electronic regulator, and is characterized in that the heating unit is mounted on a tail gas pipeline and is used for heating the tail gas pipeline; the temperature measuring unit is installed on the tail gas pipeline and used for detecting the temperature in the tail gas pipeline. The temperature measuring unit is connected with the electronic regulator and is used for sending the detected temperature to the electronic regulator; the input end of the heating switch unit is connected with the electronic regulator, and the output end of the heating switch unit is connected in series in a heating loop of the heating unit and used for controlling the heating unit to be turned on and turned off. The temperature of the tail gas pipeline can be controlled and set in a reasonable range to ensure that a reac |
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