Cleaning agent for semiconductor, preparation method and cleaning method
The invention relates to the technical field of semiconductor material cleaning agents, in particular to a semiconductor cleaning agent, a preparation method and a cleaning method.On the basis of an existing cleaning agent composed of potassium hydroxide, alkylbenzene sulfonate and polyoxyethylene a...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | FAN XIAOMAN FAN XIAOJING |
| description | The invention relates to the technical field of semiconductor material cleaning agents, in particular to a semiconductor cleaning agent, a preparation method and a cleaning method.On the basis of an existing cleaning agent composed of potassium hydroxide, alkylbenzene sulfonate and polyoxyethylene alkyl ether, a component B is added, and the components of a decomposing agent in the component B are utilized, so that the cleaning agent is prepared. After the cleaning agent finishes cleaning the surface of the silicon wafer, alkylbenzene sulfonate is decomposed, and a stable structure of a protective film formed on the surface of the silicon wafer is destroyed, so that alkylbenzene sulfonate, polyoxyethylene alkyl ether and dissociation acid are quickly decomposed by potassium hydroxide, residues of alkylbenzene sulfonate, polyoxyethylene alkyl ether and dissociation acid on the surface of the silicon wafer are reduced, and the service life of the silicon wafer is prolonged. And dynamic balance of cleaning and p |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN117736809A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN117736809A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN117736809A3</originalsourceid><addsrcrecordid>eNrjZPBwzklNzMvMS1dITE_NK1FIyy9SKE7NzUzOz0spTS7JL9JRKChKLUgsSizJzM9TyE0tychPUUjMS1FIhmmEiPEwsKYl5hSn8kJpbgZFN9cQZw_d1IL8-NTigsTk1LzUknhnP0NDc3NjMwsDS0djYtQAALVQNIA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Cleaning agent for semiconductor, preparation method and cleaning method</title><source>esp@cenet</source><creator>FAN XIAOMAN ; FAN XIAOJING</creator><creatorcontrib>FAN XIAOMAN ; FAN XIAOJING</creatorcontrib><description>The invention relates to the technical field of semiconductor material cleaning agents, in particular to a semiconductor cleaning agent, a preparation method and a cleaning method.On the basis of an existing cleaning agent composed of potassium hydroxide, alkylbenzene sulfonate and polyoxyethylene alkyl ether, a component B is added, and the components of a decomposing agent in the component B are utilized, so that the cleaning agent is prepared. After the cleaning agent finishes cleaning the surface of the silicon wafer, alkylbenzene sulfonate is decomposed, and a stable structure of a protective film formed on the surface of the silicon wafer is destroyed, so that alkylbenzene sulfonate, polyoxyethylene alkyl ether and dissociation acid are quickly decomposed by potassium hydroxide, residues of alkylbenzene sulfonate, polyoxyethylene alkyl ether and dissociation acid on the surface of the silicon wafer are reduced, and the service life of the silicon wafer is prolonged. And dynamic balance of cleaning and p</description><language>chi ; eng</language><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES ; BASIC ELECTRIC ELEMENTS ; CANDLES ; CHEMISTRY ; DETERGENT COMPOSITIONS ; DETERGENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FATTY ACIDS THEREFROM ; METALLURGY ; RECOVERY OF GLYCEROL ; RESIN SOAPS ; SEMICONDUCTOR DEVICES ; SOAP OR SOAP-MAKING ; USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240322&DB=EPODOC&CC=CN&NR=117736809A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240322&DB=EPODOC&CC=CN&NR=117736809A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FAN XIAOMAN</creatorcontrib><creatorcontrib>FAN XIAOJING</creatorcontrib><title>Cleaning agent for semiconductor, preparation method and cleaning method</title><description>The invention relates to the technical field of semiconductor material cleaning agents, in particular to a semiconductor cleaning agent, a preparation method and a cleaning method.On the basis of an existing cleaning agent composed of potassium hydroxide, alkylbenzene sulfonate and polyoxyethylene alkyl ether, a component B is added, and the components of a decomposing agent in the component B are utilized, so that the cleaning agent is prepared. After the cleaning agent finishes cleaning the surface of the silicon wafer, alkylbenzene sulfonate is decomposed, and a stable structure of a protective film formed on the surface of the silicon wafer is destroyed, so that alkylbenzene sulfonate, polyoxyethylene alkyl ether and dissociation acid are quickly decomposed by potassium hydroxide, residues of alkylbenzene sulfonate, polyoxyethylene alkyl ether and dissociation acid on the surface of the silicon wafer are reduced, and the service life of the silicon wafer is prolonged. And dynamic balance of cleaning and p</description><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CANDLES</subject><subject>CHEMISTRY</subject><subject>DETERGENT COMPOSITIONS</subject><subject>DETERGENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FATTY ACIDS THEREFROM</subject><subject>METALLURGY</subject><subject>RECOVERY OF GLYCEROL</subject><subject>RESIN SOAPS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SOAP OR SOAP-MAKING</subject><subject>USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPBwzklNzMvMS1dITE_NK1FIyy9SKE7NzUzOz0spTS7JL9JRKChKLUgsSizJzM9TyE0tychPUUjMS1FIhmmEiPEwsKYl5hSn8kJpbgZFN9cQZw_d1IL8-NTigsTk1LzUknhnP0NDc3NjMwsDS0djYtQAALVQNIA</recordid><startdate>20240322</startdate><enddate>20240322</enddate><creator>FAN XIAOMAN</creator><creator>FAN XIAOJING</creator><scope>EVB</scope></search><sort><creationdate>20240322</creationdate><title>Cleaning agent for semiconductor, preparation method and cleaning method</title><author>FAN XIAOMAN ; FAN XIAOJING</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN117736809A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CANDLES</topic><topic>CHEMISTRY</topic><topic>DETERGENT COMPOSITIONS</topic><topic>DETERGENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FATTY ACIDS THEREFROM</topic><topic>METALLURGY</topic><topic>RECOVERY OF GLYCEROL</topic><topic>RESIN SOAPS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SOAP OR SOAP-MAKING</topic><topic>USE OF SINGLE SUBSTANCES AS DETERGENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>FAN XIAOMAN</creatorcontrib><creatorcontrib>FAN XIAOJING</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FAN XIAOMAN</au><au>FAN XIAOJING</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Cleaning agent for semiconductor, preparation method and cleaning method</title><date>2024-03-22</date><risdate>2024</risdate><abstract>The invention relates to the technical field of semiconductor material cleaning agents, in particular to a semiconductor cleaning agent, a preparation method and a cleaning method.On the basis of an existing cleaning agent composed of potassium hydroxide, alkylbenzene sulfonate and polyoxyethylene alkyl ether, a component B is added, and the components of a decomposing agent in the component B are utilized, so that the cleaning agent is prepared. After the cleaning agent finishes cleaning the surface of the silicon wafer, alkylbenzene sulfonate is decomposed, and a stable structure of a protective film formed on the surface of the silicon wafer is destroyed, so that alkylbenzene sulfonate, polyoxyethylene alkyl ether and dissociation acid are quickly decomposed by potassium hydroxide, residues of alkylbenzene sulfonate, polyoxyethylene alkyl ether and dissociation acid on the surface of the silicon wafer are reduced, and the service life of the silicon wafer is prolonged. And dynamic balance of cleaning and p</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN117736809A |
| source | esp@cenet |
| subjects | ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FATTY ACIDS THEREFROM METALLURGY RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS |
| title | Cleaning agent for semiconductor, preparation method and cleaning method |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-25T08%3A45%3A00IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=FAN%20XIAOMAN&rft.date=2024-03-22&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN117736809A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |