Cleaning agent for semiconductor, preparation method and cleaning method

The invention relates to the technical field of semiconductor material cleaning agents, in particular to a semiconductor cleaning agent, a preparation method and a cleaning method.On the basis of an existing cleaning agent composed of potassium hydroxide, alkylbenzene sulfonate and polyoxyethylene alkyl ether, a component B is added, and the components of a decomposing agent in the component B are utilized, so that the cleaning agent is prepared. After the cleaning agent finishes cleaning the surface of the silicon wafer, alkylbenzene sulfonate is decomposed, and a stable structure of a protective film formed on the surface of the silicon wafer is destroyed, so that alkylbenzene sulfonate, polyoxyethylene alkyl ether and dissociation acid are quickly decomposed by potassium hydroxide, residues of alkylbenzene sulfonate, polyoxyethylene alkyl ether and dissociation acid on the surface of the silicon wafer are reduced, and the service life of the silicon wafer is prolonged. And dynamic balance of cleaning and p