Gas tank assembly for high-pressure treatment device
The present invention provides a gas tank assembly for a high-pressure treatment device, comprising: a housing having an internal space; a supply module configured so as to be disposed in the internal space, the supply module supplying a process gas to a chamber of the high-pressure processing appar...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The present invention provides a gas tank assembly for a high-pressure treatment device, comprising: a housing having an internal space; a supply module configured so as to be disposed in the internal space, the supply module supplying a process gas to a chamber of the high-pressure processing apparatus; an exhaust module configured to exhaust gas generated after processing the object in the chamber; and a filling module configured to fill the internal space with a protective gas at a pressure higher than an external pressure of the housing so as to prevent external air from flowing into the internal space.
本发明提供一种用于高压处理装置的气箱组件,其包括:壳体,具备内部空间;供给模块,被构成为配置在所述内部空间内,用于向高压处理装置的腔室供给工艺气体;排气模块,被构成为用于排出处理所述腔室中的物体之后产生的气体;以及填充模块,被构成为用于向所述内部空间以高于所述壳体的外部压力的压力填充保护气体,从而,阻止外部空气流入所述内部空间。 |
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