Method for improving Efuse uniformity

The invention provides a method for improving Efuse uniformity. A wafer comprises an anode structure used for forming an Efuse anode and a cathode structure used for forming an efuse cathode. The cathode structure is covered with an oxide layer and a SiN layer formed on the oxide layer; photoresist...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	GUO ZHENQIANG, TENG SAINAN, LI YAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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