High-haze conductive film and single-process preparation method thereof
The invention relates to a high-haze conductive film and a single-process preparation method thereof. The single-process preparation method comprises the following steps: step S1, cleaning float high-transmittance glass by adopting an alkali liquor, an acid liquor or an ion beam etching method; s2,...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to a high-haze conductive film and a single-process preparation method thereof. The single-process preparation method comprises the following steps: step S1, cleaning float high-transmittance glass by adopting an alkali liquor, an acid liquor or an ion beam etching method; s2, adopting a magnetron sputtering method, using a high-purity AZO target material, and preparing an AZO seed crystal in an air atmosphere with a certain concentration; s3, a sputtering power supply is turned off, high-vacuum air exhaust is carried out, and oxygen existing in the cavity is removed; s4, a magnetron sputtering method is adopted, a high-purity AZO target material is used, pre-sputtering is carried out in an oxygen-free environment, and then film coating is carried out; and S5, naturally cooling the coated glass to room temperature to obtain the high-haze AZO conductive film. The invention provides a simple and rapid process method for producing and manufacturing the high-haze AZO conductive film, and con |
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