Vortex wave plate preparation method and vortex wave plate
The invention discloses a preparation method of a vortex wave plate and the vortex wave plate, and relates to the field of optical materials. The invention discloses a preparation method of a vortex wave plate. The preparation method comprises the following steps: irradiating a to-be-exposed sample...
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| creator | TU XINGZHOU JANG KYUNG-HOON ZHANG YUXIN |
| description | The invention discloses a preparation method of a vortex wave plate and the vortex wave plate, and relates to the field of optical materials. The invention discloses a preparation method of a vortex wave plate. The preparation method comprises the following steps: irradiating a to-be-exposed sample coated with an optical alignment material by adopting a point light source; coating liquid crystal molecules on the optical alignment material; and curing to form the vortex wave plate. The problems that an existing vortex wave plate preparation mode is long in time consumption, insufficient in precision and the like can be solved.
本申请公开了一种涡旋波片的制备方法及涡旋波片，涉及光学材料领域。一种涡旋波片的制备方法，所述制备方法包括：采用点光源对涂布有光配向材料的待曝光样品进行照射；在所述光配向材料上涂布液晶分子；固化，形成涡旋波片。本申请能够缓解当前涡旋波片制备方式耗时长、精度不足等问题。 |
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本申请公开了一种涡旋波片的制备方法及涡旋波片，涉及光学材料领域。一种涡旋波片的制备方法，所述制备方法包括：采用点光源对涂布有光配向材料的待曝光样品进行照射；在所述光配向材料上涂布液晶分子；固化，形成涡旋波片。本申请能够缓解当前涡旋波片制备方式耗时长、精度不足等问题。</description><language>chi ; eng</language><subject>ADHESIVES ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; CHEMISTRY ; DYES ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PAINTS ; PERFORMING OPERATIONS ; PHYSICS ; POLISHES ; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240312&DB=EPODOC&CC=CN&NR=117680344A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240312&DB=EPODOC&CC=CN&NR=117680344A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TU XINGZHOU</creatorcontrib><creatorcontrib>JANG KYUNG-HOON</creatorcontrib><creatorcontrib>ZHANG YUXIN</creatorcontrib><title>Vortex wave plate preparation method and vortex wave plate</title><description>The invention discloses a preparation method of a vortex wave plate and the vortex wave plate, and relates to the field of optical materials. The invention discloses a preparation method of a vortex wave plate. The preparation method comprises the following steps: irradiating a to-be-exposed sample coated with an optical alignment material by adopting a point light source; coating liquid crystal molecules on the optical alignment material; and curing to form the vortex wave plate. The problems that an existing vortex wave plate preparation mode is long in time consumption, insufficient in precision and the like can be solved.
本申请公开了一种涡旋波片的制备方法及涡旋波片，涉及光学材料领域。一种涡旋波片的制备方法，所述制备方法包括：采用点光源对涂布有光配向材料的待曝光样品进行照射；在所述光配向材料上涂布液晶分子；固化，形成涡旋波片。本申请能够缓解当前涡旋波片制备方式耗时长、精度不足等问题。</description><subject>ADHESIVES</subject><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>CHEMISTRY</subject><subject>DYES</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>PAINTS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAKyy8qSa1QKE8sS1UoyEksAZJFqQWJRYklmfl5CrmpJRn5KQqJeSkKZegKeRhY0xJzilN5oTQ3g6Kba4izh25qQX58anFBYnJqXmpJvLOfoaG5mYWBsYmJozExagCSzi9A</recordid><startdate>20240312</startdate><enddate>20240312</enddate><creator>TU XINGZHOU</creator><creator>JANG KYUNG-HOON</creator><creator>ZHANG YUXIN</creator><scope>EVB</scope></search><sort><creationdate>20240312</creationdate><title>Vortex wave plate preparation method and vortex wave plate</title><author>TU XINGZHOU ; JANG KYUNG-HOON ; ZHANG YUXIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN117680344A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>ADHESIVES</topic><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>CHEMISTRY</topic><topic>DYES</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>PAINTS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>TU XINGZHOU</creatorcontrib><creatorcontrib>JANG KYUNG-HOON</creatorcontrib><creatorcontrib>ZHANG YUXIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TU XINGZHOU</au><au>JANG KYUNG-HOON</au><au>ZHANG YUXIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Vortex wave plate preparation method and vortex wave plate</title><date>2024-03-12</date><risdate>2024</risdate><abstract>The invention discloses a preparation method of a vortex wave plate and the vortex wave plate, and relates to the field of optical materials. The invention discloses a preparation method of a vortex wave plate. The preparation method comprises the following steps: irradiating a to-be-exposed sample coated with an optical alignment material by adopting a point light source; coating liquid crystal molecules on the optical alignment material; and curing to form the vortex wave plate. The problems that an existing vortex wave plate preparation mode is long in time consumption, insufficient in precision and the like can be solved.
本申请公开了一种涡旋波片的制备方法及涡旋波片，涉及光学材料领域。一种涡旋波片的制备方法，所述制备方法包括：采用点光源对涂布有光配向材料的待曝光样品进行照射；在所述光配向材料上涂布液晶分子；固化，形成涡旋波片。本申请能够缓解当前涡旋波片制备方式耗时长、精度不足等问题。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CHEMISTRY DYES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PAINTS PERFORMING OPERATIONS PHYSICS POLISHES PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
| title | Vortex wave plate preparation method and vortex wave plate |
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