Vortex wave plate preparation method and vortex wave plate

The invention discloses a preparation method of a vortex wave plate and the vortex wave plate, and relates to the field of optical materials. The invention discloses a preparation method of a vortex wave plate. The preparation method comprises the following steps: irradiating a to-be-exposed sample coated with an optical alignment material by adopting a point light source; coating liquid crystal molecules on the optical alignment material; and curing to form the vortex wave plate. The problems that an existing vortex wave plate preparation mode is long in time consumption, insufficient in precision and the like can be solved. 本申请公开了一种涡旋波片的制备方法及涡旋波片，涉及光学材料领域。一种涡旋波片的制备方法，所述制备方法包括：采用点光源对涂布有光配向材料的待曝光样品进行照射；在所述光配向材料上涂布液晶分子；固化，形成涡旋波片。本申请能够缓解当前涡旋波片制备方式耗时长、精度不足等问题。