Base station applied to cleaning device and cleaning system

The invention discloses a base station applied to a cleaning device and a cleaning system. The cleaning device is used for cleaning a hard to-be-cleaned surface. The base station comprises a base station body; the accommodating structure is arranged on the base station main body and is provided with an accommodating cavity, and the accommodating cavity is used for accommodating the cleaning device; when the cleaning device is taken out of the containing cavity, the cleaning device can be used for cleaning the hard face to be cleaned, and after the cleaning device completes cleaning work, the cleaning device is contained in the containing cavity. In this way, the use convenience of the cleaning device can be improved. 本申请公开了一种应用于清洁装置的基站以及清洁系统。清洁装置用于清洁硬质待清洁面，基站包括：基站主体；以及容置结构，设于基站主体且具有容置腔，容置腔用于容置清洁装置；其中，当清洁装置自容置腔中取出时，清洁装置能够用于清洁硬质待清洁面，而在清洁装置完成清洁工作后，清洁装置容置于容置腔中。通过上述方式，本申请能够改善清洁装置的使用便捷性。