X-ray source and method of aligning X-ray source
The disclosure relates to an X-ray source (100). The X-ray sources comprise an electron source (110), an adjustment device (120) for adjusting an orientation of an electron beam (e) generated by the electron source, a focusing device configured to focus the electron beam according to a focusing sett...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The disclosure relates to an X-ray source (100). The X-ray sources comprise an electron source (110), an adjustment device (120) for adjusting an orientation of an electron beam (e) generated by the electron source, a focusing device configured to focus the electron beam according to a focusing setting, a beam orientation sensor (130) arranged to generate a signal indicative of the orientation of the electron beam relative to a target location, and a beam orientation sensor (130) operably connected to the focusing device, and a controller (140) of the beam orientation sensor and the adjustment device. The disclosure also relates to an X-ray source (100) comprising a target orientation sensor (270) and a target adjustment device (280), where the controller is configured to cause the beam adjustment device and/or the target adjustment device to adjust a relative orientation between the electron beam and the target.
本披露内容涉及X射线源(100),这些X射线源包括电子源(110)、用于调节由该电子源生成的电子束(e)的取向的调节装置(120)、被配置为根据聚焦设置聚焦电子束的聚焦装置、被布置为生成指示电子 |
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