PAN standard gas generating device and method

The invention provides a PAN standard gas generating device and method, the PAN standard gas generating device comprises a reaction chamber and an ultraviolet light source, and the ultraviolet light source is located in the reaction chamber; the control unit is used for controlling parameters of gas...

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Hauptverfasser: CHEN WEI, SHI GUIJIN, LIU YINGZHI, XUE YINHAO, HU YANGJUN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention provides a PAN standard gas generating device and method, the PAN standard gas generating device comprises a reaction chamber and an ultraviolet light source, and the ultraviolet light source is located in the reaction chamber; the control unit is used for controlling parameters of gas raw materials entering the reaction chamber and turning on and turning off of the light source; the monitoring unit is used for monitoring whether the reaction in the reaction chamber is stable or not; the gas detection unit obtains the concentration of nitrogen oxide and nitrogen dioxide in the reacted gas; the calculation unit obtains control data according to the concentration output by the gas detection unit and the PAN standard gas target concentration when the ultraviolet light source is turned on and turned off, and the control data is sent to the control unit. The method has the advantages of accurate PAN standard gas concentration and the like. 本发明提供了PAN标气发生装置和方法,PAN标气发生装置包括反应室和紫外光源,所述紫外光源处于所述反应室内;控制单元用于控