Hybrid etching method and device in chip on film manufacturing process

The invention discloses a mixed etching method and equipment in a chip-on-film manufacturing process, and relates to the technical field of chip-on-film preparation, and the method comprises the steps: S1, fixing a circuit board; s2, carrying out etching processing; s3, cleaning and air drying; and S4, heating and drying. According to the mixed etching method and equipment in the chip on film manufacturing process, two liquid storage tanks are arranged and used for storing etching liquid for copper foil etching and nickel-chromium etching respectively, the two etching nozzles are controlled to ascend and descend in cooperation with a lifting sliding piece, switching between copper foil etching and nickel-chromium etching is achieved, an electric control sliding block and a longitudinal rail are arranged, and the electric control sliding block and the longitudinal rail are electrically controlled to control the two etching nozzles to ascend and descend. The device is provided with a control device for controll