Surface control and growth method of AlGaN ultraviolet quantum well

The invention discloses an AlGaN ultraviolet quantum well surface regulation and growth method, which comprises the following steps: A, raising the surface temperature of a substrate to 900-1200 DEG C, setting the pressure to be 30-600 mbar, and growing a stress regulation layer on the substrate; b,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HE ZONGJIANG, ZHANG YANG, WANG YOULIN
Format: Patent
Sprache:chi ; eng
Schlagworte:
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