Annular lining device, lining, process chamber and semiconductor process equipment
The annular lining device comprises a first annular lining (04), a barrel-shaped lining (05) and a second annular lining (06), the first annular lining (04) is connected with the first end of the barrel-shaped lining (05), the second annular lining (06) is connected with the second end of the barrel...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The annular lining device comprises a first annular lining (04), a barrel-shaped lining (05) and a second annular lining (06), the first annular lining (04) is connected with the first end of the barrel-shaped lining (05), the second annular lining (06) is connected with the second end of the barrel-shaped lining (05), the barrel-shaped lining (05) is telescopic in the axis direction of the barrel-shaped lining (05), and the second annular lining (06) is connected with the second end of the barrel-shaped lining (05). And the inner side edge of the first ring lining (04) protrudes out of the inner wall of the cylindrical lining (05) and forms an annular edge (041). The invention discloses a lining, a process chamber and semiconductor process equipment. According to the technical scheme, the problem that the shielding effect is poor due to the fact that the lining of the process chamber related to the related technology is poor in grounding electric connection can be solved.
本发明公开一种环状衬体装置,用于工艺腔室,所公开的环状衬体装置包括第一环 |
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