Negative photoresist as well as preparation method and application thereof

The invention provides a negative photoresist as well as a preparation method and application thereof. The negative photoresist is prepared from the following raw materials in specific parts: acrylic resin, a photoinitiator, a cross-linking agent and a light absorbent, the preparation raw materials of the acrylic resin comprise styrene, polybutadiene, isobornyl acrylate, dibutyl maleate and glycidyl methacrylate; the acrylic resin prepared from the specific raw materials is used as the main body resin, and is matched with the specific auxiliary agent, so that the obtained negative photoresist has the advantages of good coating uniformity and good exposure effect, also has relatively high coating film thickness and relatively good patterning effect, can resist the electroplating process of a copper electroplating solution, does not crack on the adhesive surface, and can be used for preparing the negative photoresist. And after electroplating, the angle is steep, the photoresist is removed cleanly, and the elec