Apparatus for holding wafer-shaped articles
An apparatus for holding a wafer-like article, the apparatus having an apparatus body comprising: a surface disposed to face a wafer-like article supported by the apparatus, the surface having a central recess; a first gas nozzle having an outlet on the surface outside the central recess; and a seco...
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| Hauptverfasser: | , , |
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | An apparatus for holding a wafer-like article, the apparatus having an apparatus body comprising: a surface disposed to face a wafer-like article supported by the apparatus, the surface having a central recess; a first gas nozzle having an outlet on the surface outside the central recess; and a second gas nozzle having an outlet on the surface inside the central recess.
一种用于保持晶片状物品的设备，该设备具有设备主体，所述设备主体包括：被设置为面向由该设备支撑的晶片状物品的表面，该表面具有中央凹陷部；第一气体喷嘴，其在所述中央凹陷部的外侧的该表面上具有出口；以及第二气体喷嘴，其在所述中央凹陷部内部的该表面上具有出口。 |
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