Wafer detection method, device and equipment based on spot scanning detector
The invention discloses a wafer detection method, device and equipment based on a spot scanning detector, and the method comprises the steps: controlling a rotary table to drive a wafer to rotate, and controlling the spot scanning detector to scan the wafer; according to the rotation angle of the ro...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a wafer detection method, device and equipment based on a spot scanning detector, and the method comprises the steps: controlling a rotary table to drive a wafer to rotate, and controlling the spot scanning detector to scan the wafer; according to the rotation angle of the rotary table, the position relation between the spot scanning detector and the rotation center of the rotary table and the scanning result of the spot scanning detector, a Mercator view angle sampling graph is obtained; obtaining Mercator view angle coordinates of edge points of the wafer in the Mercator view angle sampling graph; the Mercator view angle coordinates of the edge points are converted into physical coordinates with the rotation center as the original point; and determining the circle center position and the edge position of the wafer according to the physical coordinates of the edge points. By adopting the technical scheme, the circle center position and the edge position of the wafer can be simply and |
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