Feeding structure for chemical vapor deposition furnace

The invention relates to the technical field of chemical vapor deposition equipment, and discloses a feeding structure for a chemical vapor deposition furnace, which comprises a base, a plurality of gas inlet pipes are arranged on the top surface of the base, a furnace body is arranged above the base, a heating coil is fixedly mounted on the inner wall of the furnace body, a waste gas pipe is fixedly mounted at the top end of the furnace body, and a gas outlet pipe is fixedly mounted at the top end of the waste gas pipe. A high-temperature barometer is fixedly installed on the side wall of the waste gas pipe, a heating cover is arranged on the outer side of the substrate, a glass cover is arranged on the outer side of the heating cover, and the glass cover is fixedly connected with the top face of the base in a clamped mode. The reaction gas is prevented from flowing according to a fixed route and generating concentration gradient on the surface of the substrate, the air pressure upper limit in the heating co