Carrier for magnetron sputtering equipment and method for depositing TCO (Transparent Conductive Oxide) film by using carrier

The invention relates to a carrier for magnetron sputtering equipment and a method for depositing a TCO thin film by using the carrier, and belongs to the technical field of magnetron sputtering equipment coating. Comprising a bearing framework and a plurality of clamps, the clamps are detachably co...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHI HAIFENG, ZHANG JIE, HUANG JIN, ZHAO QING, KONG QINGQING, YANG LIYOU, BAO SHAOJUAN, LI SHA, JIA HUIJUN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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