Carrier for magnetron sputtering equipment and method for depositing TCO (Transparent Conductive Oxide) film by using carrier

The invention relates to a carrier for magnetron sputtering equipment and a method for depositing a TCO thin film by using the carrier, and belongs to the technical field of magnetron sputtering equipment coating. Comprising a bearing framework and a plurality of clamps, the clamps are detachably connected into the bearing framework, and the clamps are distributed on the bearing framework in an array mode. During replacement, the clamps in the bearing framework can be replaced in batches; the clamp is convenient to disassemble, so that the replacement time and the use cycle of the clamp can be shortened, the tedious step of cleaning the whole carrier is avoided, and the influence on the capacity of a battery silicon wafer is avoided; the clamp is easy to replace and clean, so that the change range of the water vapor pressure in the preset service cycle of the carrier is narrowed, the water vapor pressure in the magnetron sputtering equipment is stable, the time of process adjustment caused by the change of th