Exposure method and exposure system for focal plane area

The invention provides an exposure method and an exposure system for a focal plane area, and the method comprises the steps: obtaining a to-be-exposed picture, determining a focus position of the to-be-exposed picture, and dividing the to-be-exposed picture into a central area and an edge area; calculating and obtaining a brightness difference value and a brightness distribution standard deviation of the central region and the edge region; and finally, selecting one of the central weighted average photometry, the matrix photometry and the point photometry to expose the to-be-exposed picture based on the first preset condition, the second preset condition and the third preset condition. The central weighted average photometry, the point photometry and the matrix photometry are introduced into the self-adaptive exposure system; based on different shooting scenes and conditions, the brightness distribution difference and the brightness difference of the central area and the edge area of the picture are obtained