Simulation display system for reaction in magnetron sputtering cooling cavity

The invention relates to the technical field of reaction simulation display, in particular to a reaction simulation display system in a magnetron sputtering cooling cavity, which comprises a server, a data acquisition unit, an external presentation feedback unit, a self-checking operation unit, a co...

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Hauptverfasser: LI ZHIXING, WANG ZHEKUN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention relates to the technical field of reaction simulation display, in particular to a reaction simulation display system in a magnetron sputtering cooling cavity, which comprises a server, a data acquisition unit, an external presentation feedback unit, a self-checking operation unit, a component supervision unit, an operation and maintenance management unit, an internal presentation evaluation unit, a comprehensive presentation unit and a control strength unit, according to the method, the display device is analyzed from internal and external angles, the display effect of the device and the integrity of display information are improved, the internal angle is divided into virtual and real evaluation dimensions, namely, overall evaluation is carried out from the two angles of virtual state data and real risk data of electrical components, and the evaluation accuracy is improved. The accuracy of an analysis result can be improved, the accuracy of reasonable and targeted management of the display equip