COMPOSITION FOR REMOVING PHOTORESIST FROM SUBSTRATES AND USE THEREOF
The disclosed and claimed subject matter relates to a photoresist stripper solution comprising (i) one or more inorganic bases; (ii) two or more organic solvents; (iii) one or more corrosion inhibitors, and may optionally comprise (iv) one or more secondary solvents. 所公开和要求保护的主题涉及光致抗蚀剂剥离剂溶液，其包含(i)一种...
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| creator | CAO YUANMEI WANG LILI |
| description | The disclosed and claimed subject matter relates to a photoresist stripper solution comprising (i) one or more inorganic bases; (ii) two or more organic solvents; (iii) one or more corrosion inhibitors, and may optionally comprise (iv) one or more secondary solvents.
所公开和要求保护的主题涉及光致抗蚀剂剥离剂溶液，其包含(i)一种或多种无机碱；(ii)两种或更多种有机溶剂；(iii)一种或多种腐蚀抑制剂，并且可以任选地包含(iv)一种或多种二级溶剂。 |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN117460996A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN117460996A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN117460996A3</originalsourceid><addsrcrecordid>eNqNyrEKwjAQANAsDqL-w_kBgkWpdIzpxWRIrtxdu5YicRIt1P_HxQ9westbm9ZR6kiiRsrgiYEx0RDzDbpASowSRcEzJZD-KspWUcDmFnpB0ICM5Ldm9ZieS9n93Ji9R3XhUOb3WJZ5updX-YwuV9XlXB-bpranf84Xn3YsWA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>COMPOSITION FOR REMOVING PHOTORESIST FROM SUBSTRATES AND USE THEREOF</title><source>esp@cenet</source><creator>CAO YUANMEI ; WANG LILI</creator><creatorcontrib>CAO YUANMEI ; WANG LILI</creatorcontrib><description>The disclosed and claimed subject matter relates to a photoresist stripper solution comprising (i) one or more inorganic bases; (ii) two or more organic solvents; (iii) one or more corrosion inhibitors, and may optionally comprise (iv) one or more secondary solvents.
所公开和要求保护的主题涉及光致抗蚀剂剥离剂溶液，其包含(i)一种或多种无机碱；(ii)两种或更多种有机溶剂；(iii)一种或多种腐蚀抑制剂，并且可以任选地包含(iv)一种或多种二级溶剂。</description><language>chi ; eng</language><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CANDLES ; CHEMISTRY ; CINEMATOGRAPHY ; DETERGENT COMPOSITIONS ; DETERGENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; FATTY ACIDS THEREFROM ; HOLOGRAPHY ; MATERIALS THEREFOR ; METALLURGY ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; RECOVERY OF GLYCEROL ; RESIN SOAPS ; SEMICONDUCTOR DEVICES ; SOAP OR SOAP-MAKING ; USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240126&DB=EPODOC&CC=CN&NR=117460996A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240126&DB=EPODOC&CC=CN&NR=117460996A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CAO YUANMEI</creatorcontrib><creatorcontrib>WANG LILI</creatorcontrib><title>COMPOSITION FOR REMOVING PHOTORESIST FROM SUBSTRATES AND USE THEREOF</title><description>The disclosed and claimed subject matter relates to a photoresist stripper solution comprising (i) one or more inorganic bases; (ii) two or more organic solvents; (iii) one or more corrosion inhibitors, and may optionally comprise (iv) one or more secondary solvents.
所公开和要求保护的主题涉及光致抗蚀剂剥离剂溶液，其包含(i)一种或多种无机碱；(ii)两种或更多种有机溶剂；(iii)一种或多种腐蚀抑制剂，并且可以任选地包含(iv)一种或多种二级溶剂。</description><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CANDLES</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>DETERGENT COMPOSITIONS</subject><subject>DETERGENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>FATTY ACIDS THEREFROM</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>RECOVERY OF GLYCEROL</subject><subject>RESIN SOAPS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SOAP OR SOAP-MAKING</subject><subject>USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyrEKwjAQANAsDqL-w_kBgkWpdIzpxWRIrtxdu5YicRIt1P_HxQ9westbm9ZR6kiiRsrgiYEx0RDzDbpASowSRcEzJZD-KspWUcDmFnpB0ICM5Ldm9ZieS9n93Ji9R3XhUOb3WJZ5updX-YwuV9XlXB-bpranf84Xn3YsWA</recordid><startdate>20240126</startdate><enddate>20240126</enddate><creator>CAO YUANMEI</creator><creator>WANG LILI</creator><scope>EVB</scope></search><sort><creationdate>20240126</creationdate><title>COMPOSITION FOR REMOVING PHOTORESIST FROM SUBSTRATES AND USE THEREOF</title><author>CAO YUANMEI ; WANG LILI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN117460996A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CANDLES</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>DETERGENT COMPOSITIONS</topic><topic>DETERGENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>FATTY ACIDS THEREFROM</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>RECOVERY OF GLYCEROL</topic><topic>RESIN SOAPS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SOAP OR SOAP-MAKING</topic><topic>USE OF SINGLE SUBSTANCES AS DETERGENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>CAO YUANMEI</creatorcontrib><creatorcontrib>WANG LILI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CAO YUANMEI</au><au>WANG LILI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>COMPOSITION FOR REMOVING PHOTORESIST FROM SUBSTRATES AND USE THEREOF</title><date>2024-01-26</date><risdate>2024</risdate><abstract>The disclosed and claimed subject matter relates to a photoresist stripper solution comprising (i) one or more inorganic bases; (ii) two or more organic solvents; (iii) one or more corrosion inhibitors, and may optionally comprise (iv) one or more secondary solvents.
所公开和要求保护的主题涉及光致抗蚀剂剥离剂溶液，其包含(i)一种或多种无机碱；(ii)两种或更多种有机溶剂；(iii)一种或多种腐蚀抑制剂，并且可以任选地包含(iv)一种或多种二级溶剂。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY CINEMATOGRAPHY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FATTY ACIDS THEREFROM HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS |
| title | COMPOSITION FOR REMOVING PHOTORESIST FROM SUBSTRATES AND USE THEREOF |
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