Gallium-indium-oxide photoelectric detector and preparation method thereof

According to the gallium-indium-oxide photoelectric detector and the preparation method thereof provided by the invention, the photoelectric detector is prepared based on a flexible substrate of mica and has excellent bending resistance, that is, the device can be bent for thousands of times accordi...

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Hauptverfasser: FU TAO, XIAO GONGLI, CHEN YONGHE, LI QI, WANG YANGPEIHUA, DENG YANRONG, LIAO QING, CHEN ZANHUI, PENG YING, SUN TANGYOU, ZHANG FABI, WANG ZHEFENG, SHOU MEIHUA, ZHOU JUAN, LIU XINGPENG, LI HAI'OU
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:According to the gallium-indium-oxide photoelectric detector and the preparation method thereof provided by the invention, the photoelectric detector is prepared based on a flexible substrate of mica and has excellent bending resistance, that is, the device can be bent for thousands of times according to a certain angle while the performance is almost unchanged, and the gallium-indium-oxide photoelectric detector can be applied to wearable photoelectric detectors. According to the flexible gallium-indium-oxide photoelectric detector, a layer of gallium-indium-oxide thin film is grown on a mica substrate by using pulse laser deposition equipment, annealing is performed in air by using a high-temperature annealing furnace, and finally a Ti/Au interdigital electrode is grown on the gallium-indium-oxide thin film by using a metal mask by using a magnetron sputtering method, so that the flexible gallium-indium-oxide photoelectric detector is prepared. The gallium-indium-oxide photoelectric detector is successfully