Maskless photoetching optical system based on periodically stacked rectangular super lens and phase shift DMD (Digital Micromirror Device)

The invention discloses a maskless photoetching optical system based on a periodically stacked rectangular super lens and a phase shift DMD (Digital Micromirror Device), which comprises the following steps that a laser emits laser, and an ultraviolet objective lens is adopted to focus the light; the...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	GUO XIAOWEI, PAN WEIFAN, DU LIANGGUANG, XIANG ZHIQIANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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