Maskless photoetching optical system based on periodically stacked rectangular super lens and phase shift DMD (Digital Micromirror Device)

The invention discloses a maskless photoetching optical system based on a periodically stacked rectangular super lens and a phase shift DMD (Digital Micromirror Device), which comprises the following steps that a laser emits laser, and an ultraviolet objective lens is adopted to focus the light; then, a pinhole filter is used for eliminating high-frequency noise generated when a light beam passes through an objective lens and other optical elements, a collimating lens is used for converting a spherical wave into a plane wave to enable the light to be parallel, and the parallel light is combined with a phase shift DMD to generate specific spatial intensity distribution for a shaping process; laser reflected by the phase shift DMD is shrunk and imaged on a target through a 4f imaging system and a periodically stacked rectangular super lens, single exposure is divided into a plurality of short exposures to increase the number of times of measurement, and a matched digital holographic feedback system measures an