Feeding mechanism of graphitization furnace of isostatic pressing graphite for manufacturing large semiconductor silicon wafer

The invention relates to the technical field of graphitization furnaces, in particular to a graphitization furnace feeding mechanism of isostatic pressing graphite for semiconductor large silicon wafer manufacturing, which comprises a graphitization furnace, one side of the graphitization furnace is...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LYU ZUNHUA, JI BIN, FENG YUCHI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BLASTING DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS,IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KINDOF FURNACE FURNACES HEATING KILNS LIGHTING MECHANICAL ENGINEERING OVENS RETORTS WEAPONS
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