Feeding mechanism of graphitization furnace of isostatic pressing graphite for manufacturing large semiconductor silicon wafer

The invention relates to the technical field of graphitization furnaces, in particular to a graphitization furnace feeding mechanism of isostatic pressing graphite for semiconductor large silicon wafer manufacturing, which comprises a graphitization furnace, one side of the graphitization furnace is...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LYU ZUNHUA, JI BIN, FENG YUCHI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention relates to the technical field of graphitization furnaces, in particular to a graphitization furnace feeding mechanism of isostatic pressing graphite for semiconductor large silicon wafer manufacturing, which comprises a graphitization furnace, one side of the graphitization furnace is provided with a stair, one side of the top end of the graphitization furnace is provided with an electric control rotating bracket, and the electric control rotating bracket is arranged in an inverted L shape. A feeding driving mechanism is fixedly installed at the top end of the electric control rotating support, the feeding driving mechanism is arranged above the lifting connecting mechanism, the feeding driving mechanism is connected with the lifting connecting mechanism through a rope, a material containing frame is connected to the bottom end of the lifting connecting mechanism in a hanging mode, and a transverse rod is arranged on the circumferential side wall of the lifting connecting mechanism; during feed