Rapid vacuumizing method

The invention discloses a rapid vacuum pumping method which comprises the following steps: step 1, providing a vacuum chamber, arranging slow pumping valves on two sides below the vacuum chamber, arranging a main pumping valve in the middle position, connecting the main pumping valve and the slow pu...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ZHANG YINGCHUN, LIU JIEYA
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:The invention discloses a rapid vacuum pumping method which comprises the following steps: step 1, providing a vacuum chamber, arranging slow pumping valves on two sides below the vacuum chamber, arranging a main pumping valve in the middle position, connecting the main pumping valve and the slow pumping valves in parallel through a vacuum pipeline, connecting the upper ends of the valves with the vacuum chamber, and connecting the lower ends of the valves with the vacuum chamber; the lower end of the parallel pipeline is connected with the exhaust pump set; step 2, arranging one or more groups of gas uniformizing plates between the exhaust port of the vacuum chamber and the carrier plate; 3, the carrier plate full of the stacked substrates is conveyed into a vacuum chamber through a conveying roller, firstly, slow pumping valves on the two sides are opened, gas above and below the carrier plate is discharged away for the first time through a gas uniformizing plate, after gas in the vacuum chamber is diluted,