Method for manufacturing mask blank, mask blank, and photomask

The invention relates to a manufacturing method of a mask blank, the mask blank and a photomask. This mask blank has a layer that serves as a phase shift mask. The mask blank has a mask layer that is laminated on a transparent substrate, has phase shift ability, and contains chromium. The mask layer...

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Bibliographische Detailangaben
Hauptverfasser:	SEKINE MASAHIRO, HIGASHI KOYURI, SHIOZAKI EIJI, YAMADA SHINGO, MOCHIZUKI SATORU, MORIYAMA, KUMIKO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention relates to a manufacturing method of a mask blank, the mask blank and a photomask. This mask blank has a layer that serves as a phase shift mask. The mask blank has a mask layer that is laminated on a transparent substrate, has phase shift ability, and contains chromium. The mask layer contains oxygen and nitrogen. The composition ratio (O/N) of oxygen to nitrogen on the surface of the mask layer on the side away from the transparent substrate is 20 or more. 本发明涉及一种掩模坯的制造方法、掩模坯及光掩模。本发明的掩模坯具有成为相移掩模的层。所述掩模坯具有层叠于透明基板上且具有相移能力并含有铬的掩模层。所述掩模层含有氧和氮。所述掩模层的远离所述透明基板的一侧的表面上的氧与氮的组成比O/N为20以上。