Upper electrode assembly, plasma processing device and plasma processing method

The invention relates to an upper electrode assembly, a plasma processing device and a processing method. The upper electrode assembly comprises a base, an upper electrode, a gas distribution part and a lifting mechanism. The upper electrode comprises a first electrode and a second electrode, the fi...

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Bibliographische Detailangaben
1. Verfasser:	HUANG WULIN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	The invention relates to an upper electrode assembly, a plasma processing device and a processing method. The upper electrode assembly comprises a base, an upper electrode, a gas distribution part and a lifting mechanism. The upper electrode comprises a first electrode and a second electrode, the first electrode is an annular electrode plate and is connected to the base, the second electrode is correspondingly arranged in the opening area of the first electrode, and a plurality of vent holes are formed in the second electrode. The gas distribution piece is located above the second electrode and connected with the base. The lifting mechanism is connected with the base and the second electrode, and the lifting mechanism is used for driving the second electrode to move up and down. When the second electrode enters the reaction chamber, the back surface of the second electrode enters the reaction area of the reaction chamber, plasma cleaning treatment can be carried out on the back surface of the second electrode