Image sensor, manufacturing method thereof and photoetching mask

The invention provides an image sensor, a manufacturing method and a photoetching mask, and the image sensor comprises a first chip region which at least comprises a first sub-chip region and a second sub-chip region, the first sub-chip region is arranged along a first preset direction, and the seco...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HENG JIAWEI, HOU JINJIAN, MO YAOWU, XU CHEN, CHEN PENG, REN GUANJING
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!