Double-sided photoetching alignment method and double-sided photoetching system

The invention discloses a double-sided photoetching alignment method and a double-sided photoetching system.The method comprises the steps that after first coordinate information and second coordinate information of a preset target point are obtained, a coordinate conversion relational expression is obtained according to the first coordinate information and the second coordinate information, and after an A-side exposure coordinate matrix of a preset pattern array is obtained, a coordinate conversion relational expression is obtained; obtaining a B-surface exposure conversion coordinate matrix according to the coordinate conversion relational expression, and calculating according to the obtained B-surface exposure conversion coordinate matrix and the obtained B-surface theoretical exposure coordinate matrix to obtain an exposure correction matrix; therefore, through the exposure correction matrix, the theoretical exposure coordinate matrix of the B surface can be obtained by combining the A surface exposure co