Film forming apparatus
The invention provides a film forming apparatus capable of efficiently heating a workpiece and forming a film. A film forming apparatus according to an embodiment includes: a chamber capable of having a vacuum inside; a rotating table which is provided in the chamber, holds a plurality of workpieces...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides a film forming apparatus capable of efficiently heating a workpiece and forming a film. A film forming apparatus according to an embodiment includes: a chamber capable of having a vacuum inside; a rotating table which is provided in the chamber, holds a plurality of workpieces, and circularly conveys the workpieces along a circumferential trajectory; a film-forming unit which has a plasma generator for plasma-converting a sputtering gas introduced between a target containing a film-forming material and the rotating table, and which forms a film by depositing particles of the film-forming material on the workpiece being cyclically conveyed by the rotating table by sputtering; a film processing unit that processes a film formed by stacking the workpiece being cyclically conveyed by the rotating table by the film forming unit; a plurality of holding regions for holding each workpiece, the holding regions being provided in an annular film formation region facing the film formation unit and |
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