Seamless transfer method of graphene film with uniform conductivity
The invention discloses a seamless transfer method of a graphene film with uniform conductivity, which is characterized in that PMMA (polymethyl methacrylate) is taken as a carrier in a traditional method, PMMA/graphene is transferred to an insulating substrate after chemical etching of a metal cata...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a seamless transfer method of a graphene film with uniform conductivity, which is characterized in that PMMA (polymethyl methacrylate) is taken as a carrier in a traditional method, PMMA/graphene is transferred to an insulating substrate after chemical etching of a metal catalyst substrate on which CVD (chemical vapor deposition) graphene grows, and PMMA is further removed, so that graphene is exposed to serve as an electrode. However, the graphene is damaged in the PMMA removal process, and the conductivity uniformity of the graphene is seriously influenced. Compared with the prior art, the method has the obvious advantages that the graphene with upward graphene/PMMA can be transferred to the target substrate together, the graphene directly serves as an electrode, PMMA does not need to be removed, the adverse effect of graphene damage on a thin film conductive channel is completely avoided, and finally the high-performance uniform-conductivity graphene transparent thin film is obtaine |
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