Method of manufacturing microelement

A method of manufacturing a micro component includes: preparing a gallium nitride-based epitaxial structure including a p-type gallium nitride layer, an n-type gallium nitride layer on the p-type gallium nitride layer, and an undoped gallium nitride layer on the n-type gallium nitride layer; forming a photoresist layer on the gallium nitride-based epitaxial structure, and enabling the undoped gallium nitride layer to be in contact with the photoresist layer; patterning the photoresist layer; performing a plasma etching process on the gallium nitride-based epitaxial structure through the patterned photoresist layer until the patterned photoresist layer is completely removed, so that a plurality of bosses are formed on the etched gallium nitride-based epitaxial structure, and the height of the bosses is at least 1.0 [mu] m; and continuing to execute the plasma etching process until the undoped gallium nitride layer is completely removed, and cutting the etched gallium nitride-based epitaxial structure into a pl