Substrate cleaning device

The present invention relates to a substrate cleaning apparatus, comprising: a substrate support unit that rotates a substrate and holds the substrate; a brush unit that cleans the substrate using a cleaning brush that is formed in a roller shape and rotates while being in contact with the surface of the substrate; and the vibration sensor is arranged on the brush unit and is used for sensing vibration generated when the cleaning brush is in contact with the substrate, so that the cleaning result can be predicted before the cleaning is finished, and the process efficiency is improved. 本发明涉及一种基板清洗装置，该基板清洗装置包括：基板支撑单元，使基板进行自转并保持所述基板；刷单元，其使用清洗刷清洗所述基板，所述清洗刷形成为辊状且与基板表面接触的同时进行旋转；振动传感器，其设置于所述刷单元，用于感测所述清洗刷与所述基板在接触状态下产生的振动，从而在清洗结束之前能够预测清洗结果，提高工序效率。