TEMPERATURE CONTROL ASSEMBLY FOR SUBSTRATE PROCESSING APPARATUS AND METHOD OF USING SAME

Exemplary embodiments of the present disclosure provide improved reactor systems, assemblies, and methods for controlling the temperature within a reactor system, such as the temperature of a gas supply unit. Exemplary systems and methods employ an exhaust unit to move fluid over a portion of a gas...

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Bibliographische Detailangaben
Hauptverfasser:	JUNG HEEUL, JEON YON-JONG, JEON SUNG-HUN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Exemplary embodiments of the present disclosure provide improved reactor systems, assemblies, and methods for controlling the temperature within a reactor system, such as the temperature of a gas supply unit. Exemplary systems and methods employ an exhaust unit to move fluid over a portion of a gas supply unit to better control the temperature of the gas supply unit. 本公开的示例性实施例提供了改进的反应器系统、组件和用于控制反应器系统内的温度(例如气体供应单元的温度)的方法。示例性系统和方法采用排气单元以使流体在气体供应单元的一部分上移动，以更好地控制气体供应单元的温度。