EUV metal photoresist as well as preparation method and application thereof

The invention discloses an EUV (Extreme Ultraviolet) metal photoresist as well as a preparation method and application thereof. The photoresist composition provided by the invention comprises the following components: a compound A as shown in the following formula, ptycene B as shown in the followin...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	FANG SHUNONG, WANG SU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!