Semiconductor element and manufacturing method thereof

The invention discloses a semiconductor element and a manufacturing method thereof, and the method for manufacturing the semiconductor element mainly comprises the steps: providing a substrate comprising a resistance region, forming a first gate structure in the resistance region, forming a first in...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: BAI QIHONG, LI GUOXING, XUE SHENGYUAN, QIU YONGZHEN, LIN JUNXIAN
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!