Filtering and purifying device and method for photoresist film-forming resin
The invention belongs to the technical field of photoresist, and discloses a filtering and purifying device for photoresist film-forming resin, which comprises a treatment cylinder, a primary filtering plate is sleeved in the treatment cylinder, a first guide sleeve is fixedly sleeved in the treatme...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention belongs to the technical field of photoresist, and discloses a filtering and purifying device for photoresist film-forming resin, which comprises a treatment cylinder, a primary filtering plate is sleeved in the treatment cylinder, a first guide sleeve is fixedly sleeved in the treatment cylinder, and the bottom surface of the primary filtering plate is fixedly communicated with a sleeve rod. According to the invention, a photoresist film-forming resin solution subjected to secondary filtration is guided into a plurality of groups of chromatographic columns again to perform chromatographic separation by simultaneously cooperating with the communicating mechanisms movably mounted at the bottom, actual three different types of separation processes are synthesized together, and the three groups of filtration modes are integrated inside and at the bottom of the treatment cylinder, so that the intermediate operation is greatly reduced, and the efficiency is improved. After the initial photoresist fil |
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