Lithographic apparatus and method for illumination uniformity correction

A lithographic apparatus comprising: an illumination system configured to condition a radiation beam; and a uniformity correction system configured to adjust an intensity profile of the radiation beam. The lithographic apparatus includes a control system configured to control the uniformity correcti...

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Bibliographische Detailangaben
Hauptverfasser:	HARTGERS, ANJA, SOTROPOULOS NIKOLAOS, STEEGHO MARCO MATHEUS LOUIS, YPMA MICHAEL FREDERIK
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic apparatus comprising: an illumination system configured to condition a radiation beam; and a uniformity correction system configured to adjust an intensity profile of the radiation beam. The lithographic apparatus includes a control system configured to control the uniformity correction system based at least in part on a thermal state criterion indicative of a thermal state of a portion of the lithographic apparatus. 一种光刻设备，包括：照射系统，照射系统被配置为调节辐射束；以及均匀性校正系统，均匀性校正系统被配置为调节辐射束的强度轮廓。该光刻设备包括控制系统，控制系统被配置为至少部分地基于热状态标准来控制均匀性校正系统，该热状态标准指示光刻设备的部分的热状态。