Device for inducing plasma to be injected into substrate through laser
The invention relates to a device for injecting plasmas into a substrate through laser induction. The device comprises a laser induction assembly, an ion acceleration assembly, a vacuum injection assembly and a rotary supporting assembly. The ion acceleration assembly is installed at the upper end o...
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The invention relates to a device for injecting plasmas into a substrate through laser induction. The device comprises a laser induction assembly, an ion acceleration assembly, a vacuum injection assembly and a rotary supporting assembly. The ion acceleration assembly is installed at the upper end of the vacuum injection assembly, the laser induction assembly is arranged on the upper side of the ion acceleration assembly, and the output end of the rotary supporting assembly is located in the vacuum injection assembly; plasma formed by the laser induction assembly enters the vacuum injection assembly after being accelerated and selected by the ion acceleration assembly and is injected into a substrate on the rotary supporting assembly. The plasma injection efficiency can be improved, the structure is simple, and operation is easy and convenient.
本发明涉及一种激光诱导等离子体注入底材的装置,包括激光诱导组件、离子加速组件、真空注入组件和旋转支撑组件;所述离子加速组件安装在所述真空注入组件上端,所述离子加速组件上侧设置有所述激光诱导组件,所述旋转支撑组件输出端位于所述真空注入组件内;所述激光诱导组件形成的等离子经所述离子加速组件加速挑选后进入至所述真空注入组件内并注入至所述旋 |
---|