Novel film quantum yield testing device and quantum yield testing method thereof

The invention provides a novel film quantum yield testing device and a quantum yield testing method thereof.According to the device and the method, on the basis of the photoelectric effect, under the ultrahigh vacuum environment, an LED light source emits ultraviolet light to irradiate the surface of a sample, photoelectrons are collected through an optical integrating sphere and converted into electric signals to be output; the electrometer is used for collecting and processing high-resolution electric signals, bias voltage is applied through the source meter between the integrating sphere and the electrometer to regulate and control the size of photocurrent, and finally the work function of the surface of a sample is obtained through the positive bias voltage needed when the photocurrent is reduced to zero. And obtaining the quantum yield of the sample according to the saturated light current under the action of the external bias voltage and the calibrated surface ultraviolet light intensity. Precise measur